کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
1684894 | 1010540 | 2009 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
On features of metal and binary compound sputtering by low-energy ions
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
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چکیده انگلیسی
Molecular dynamic simulation has been used to study how the characteristics of metal and binary compound sputtering change under the bombardment by different low-energy ions. The influence of the target parameters on the anomalous mass dependence of sputtering yield has been investigated, both for targets with similar and very different values of density, the lattice constant and the surface binding energy. Together with the ratio of the target atoms’ mass to the mass of the ions, the density of the target and the binding energy turn out to be the important parameters that determine the unusual shape of the mass dependence of sputtering by low-energy ions.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 267, Issue 16, 15 August 2009, Pages 2735–2739
Journal: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms - Volume 267, Issue 16, 15 August 2009, Pages 2735–2739
نویسندگان
E.Yu. Zykova, V.E. Yurasova, S.S. Elovikov,