Photo-catalytic titanium oxide film deposition by atmospheric TPCVD using vortex Ar plasma jet

In order to generate the vortex plasma jet, the vortex flow creation nozzle (vortex nozzle) was equipped at the head of the plasma torch. Consequently, by equipment of the vortex nozzle, plasma jet released from the plasma torch ran along the inner wall of the vortex nozzle and the plasma jet was changed into vortex plasma jet in the vortex nozzle. As for the titanium oxide film deposition, anatase rich titanium oxide film with uniform thickness distribution could be obtained on the 304 stainless steel substrate. The film deposition rate at the center on the condition of 30 mm in deposition distance was approximately 8 μm/min. Besides, since the anatase rich film indicated hydrophilic and methylene-blue droplet on the film was decolored by UV irradiation in cases of methylene-blue wettability and decoloration tests, it was proved that the anatase rich film have photocatalytic properties. Especially, in case of the film deposited on the condition of 30 mm in deposition distance, methylene-blue droplet was perfectly decolored by 48 h UV irradiation. From these results, this technique was found to have high potential for uniform film deposition by TPCVD.