Growth of La0.7Sr0.3MnO3 films on Si(0 0 1) using SrMnO3 template layer

Using RF magnetron sputtering, we have successfully grown (1 1 0) orientated La0.7Sr0.3MnO3 (LSMO) films on Si(0 0 1) wafers using SrMnO3 (SMO) as a template layer. The X-ray diffraction (XRD) patterns of the SMO/Si heterostructures indicate that SMO grows along the (1 1 0) orientation, the orientation relationship between the SMO thin film and the Si (0 0 1) substrate being given by (0 1 1)SMO∣∣(0 0 1)Si and [011¯]SMO∣∣[0 1 0]Si. From the XRD patterns of the LSMO/SMO/Si heterostructures, we find that with an increase of substrate temperature, the required thickness of SMO, which plays an effective role of tuning the preferential orientation of LSMO, will decrease at first and then increase. It is thought that this originates from the fact that the crystallization of SMO is not perfect at low temperatures whereas too high a temperature results in reaction and diffusion at the interface of the two layers.