کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1790620 1524444 2014 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Improvement of the thermal design in the SiC PVT growth process
موضوعات مرتبط
مهندسی و علوم پایه فیزیک و نجوم فیزیک ماده چگال
پیش نمایش صفحه اول مقاله
Improvement of the thermal design in the SiC PVT growth process
چکیده انگلیسی

The physical vapor transport (PVT) method is used to grow silicon carbide (SiC) crystals, which are difficult to be grown by other methods. In this paper, a field-coordination theory is involved to optimize the SiC PVT growth process. By using a finite volume-based computational method, we calculate the flow field as well as species concentration field before and after improvement of the thermal design, respectively. The shape of the SiC crystal grown using the improved thermal design is also shown.


► For the first time, a field-coordination theory is involved to optimize the SiC PVT growth system.
► In this paper, the improvement is achieved by inserting a graphite insulation above the power source.
► The yield of crystal can be increased by improving the shape of the crystal growth interface.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Crystal Growth - Volume 385, 1 January 2014, Pages 34–37
نویسندگان
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