Pulse deposition of large area, patterned manganese oxide nanowires in variable aspect ratios without templates

Manganese oxide nanowires with β-MnOOH in core and Mn3O4 in shell were successfully plated onto various conductive substrates from a Mn(CH3COO)2 solution by anodic deposition under a two-electrode, pulse-rest mode. The aspect ratio of uniform nanowire morphologies in cm2 scale is controllable by varying the deposition variables. Patterned MnOx nanowire arrays were obtained by combining lithographic and electroplating techniques demonstrated to be a powerful method for preparing MnOx nanowires in the field emission (FE) array cathodes with a low turn-on voltage (∼3.4 V/μm at 1 μA/cm2).