کد مقاله کد نشریه سال انتشار مقاله انگلیسی ترجمه فارسی نسخه تمام متن
4993401 1368174 2018 10 صفحه PDF ندارد دانلود رایگان
عنوان انگلیسی مقاله
Active control of evaporative solution deposition by means of modulated gas phase convection
ترجمه فارسی عنوان
کنترل فعال رسوب محلول تبخیر با استفاده از همرفت فازی گاز مدوله شده
کلمات کلیدی
پردازش محلول؛ تولید الگو؛ تبخیر؛ فیلم های مایع نازک؛ لیتوگرافی تبخیری؛
Solution processing; Pattern generation; Evaporation; Thin liquid films; Evaporative lithography;
موضوعات مرتبط
مهندسی و علوم پایه مهندسی شیمی جریان سیال و فرایندهای انتقال
چکیده انگلیسی

•A patterning method for solution layers of functional materials is proposed.•The method relies on modulating the solvent vapor saturation above the liquid.•Dry gas is injected through nozzles, which accelerates evaporation where desired.

In solution processing, functional materials are dissolved or dispersed in a solvent and deposited typically as a thin liquid film on a substrate. After evaporation of the solvent, a dry layer remains. We propose an ‘active’, non-contact technique for evaporative pattern formation that does not require any substrate modification. It is based on an array of nozzles, some of which introduce a dry carrier gas in the air space above the liquid film. By spatially modulating the solvent vapor saturation above the liquid, patterns in the dry layer thickness can be induced in a controlled fashion. In this manuscript we study pattern formation due to a single pixel of such a nozzle array, by means of quantitative experiments and numerical simulations.

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ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: International Journal of Heat and Mass Transfer - Volume 117, February 2018, Pages 303-312
نویسندگان
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