Highly-impermeable Al2O3/HfO2 moisture barrier films grown by low-temperature plasma-enhanced atomic layer deposition

Highly-impermeable Al2O3/HfO2 moisture barrier films grown by low-temperature plasma-enhanced atomic layer deposition

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Organic Electronics - Volume 50, November 2017, Pages 296-303

Lae Ho Kim, Jin Hyuk Jang, Yong Jin Jeong, Kyunghun Kim, Yonghwa Baek, Hyeok-jin Kwon, Tae Kyu An, Sooji Nam, Se Hyun Kim, Jaeyoung Jang, Chan Eon Park,