Study of process parameters and formative mechanism of patterns on a dip-pen nanolithography array using molecular dynamics simulations

Study of process parameters and formative mechanism of patterns on a dip-pen nanolithography array using molecular dynamics simulations

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Polymer - Volume 53, Issue 3, 2 February 2012, Pages 857-863

Cheng-Da Wu, Te-Hua Fang, Tsung-Tse Wu,