کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5399669 | 1505907 | 2014 | 9 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Hâ ion implantation induced ten-fold increase of photoluminescence efficiency in single layer InAs/GaAs quantum dots
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موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
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چکیده انگلیسی
We demonstrate a ten-fold increase in photoluminescence (PL) efficiency from 50Â keV Hâ ion-implanted InAs/GaAs quantum dots (QDs) at a temperature of 8Â K and/or 145Â K. Enhancement occurred without post-annealing treatment. PL efficiency increased with increasing implantation fluence from 6Ã1012Â ions/cm2 up to an optimum value of 2.4Ã1013Â ions/cm2, beyond which PL efficiency decreased drastically (up to a fluence of 2.4Ã1015Â ions/cm2). Passivation of non-radiative recombination centres (due to direct interaction of Hâ ions with lattice defects) and de-excitation of photo-generated carriers to QDs through quantum mechanical tunnelling via Hâ ion-induced defects (e-traps) that are created near the QD-cap layer interface, resulted in PL efficiency enhancement. Shallow e-traps with activation energy ~90Â meV and 30Â meV created near the conduction band of GaAs cap layer for the samples implanted with Hâ of fluence 6Ã1012 and 2.4Ã1013Â ions/cm2 respectively are identified using low temperature PL study. Contribution of de-trapped electrons from the e-traps to the QDs enhanced the PL efficiency at 145Â K. Cross-section transmission electron microscopy and X-ray diffraction study revealed that the structural damage created by Hâ ions at the high fluence level of 2.4Ã1015Â ions/cm2, caused the degradation in PL efficiency.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Journal of Luminescence - Volume 153, September 2014, Pages 109-117
Journal: Journal of Luminescence - Volume 153, September 2014, Pages 109-117
نویسندگان
R. Sreekumar, A. Mandal, S. Chakrabarti, S.K. Gupta,