|کد مقاله||کد نشریه||سال انتشار||مقاله انگلیسی||ترجمه فارسی||نسخه تمام متن|
|540435||871311||2017||4 صفحه PDF||سفارش دهید||دانلود کنید|
This paper proposes a new concept of a RNIL (roller nanoimprint lithography) system. The system does not require the roll stamp that is necessary in the conventional RNIL system, and it easily transfers patterns from a hard stamp to a flexible substrate. Generally, hard stamps such as Si wafers are of a circular shape. While imprinting with a hard stamp using the RNIL system, the pressing force of the press roller in the system varies as the length of the contact line between the circular-type hard stamp and the roller changes. In this study, the contact force profile is presented and is then implemented. Micro- and nano-scale patterns are transferred from Si stamps onto thin and flexible PC (polycarbonate) substrates. Then performance of the system is the evaluated by SEM images.
Journal: Microelectronic Engineering - Volume 88, Issue 8, August 2011, Pages 2017–2020