کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
545864 | 1450556 | 2008 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Reliability and defectivity comparison of n- and p-channel SLS ELA polysilicon TFTs fabricated with a novel crystallization technique
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی کامپیوتر
سخت افزارها و معماری
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چکیده انگلیسی
SLS ELA n- and p-channel polysilicon TFTs fabricated with a novel technique were investigated, oriented both along the preferential and the non-preferential direction. The degradation mechanisms proved very different between n- and p-channel devices, while the channel orientation had a larger effect on n-channel devices than on p-ones. In order to probe the reasons causing this effect we applied DLTS analysis to both n- and p-channel devices oriented along both directions, receiving valuable information about the defectivity differences in n- and p-polysilicon films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronics Reliability - Volume 48, Issues 8–9, August–September 2008, Pages 1544–1548
Journal: Microelectronics Reliability - Volume 48, Issues 8–9, August–September 2008, Pages 1544–1548
نویسندگان
D.C. Moschou, M.A. Exarchos, D.N. Kouvatsos, G.J. Papaioannou, A. Arapoyanni, A.T. Voutsas,