The influence of anatase titanium dioxide film (0Â 0Â 1) preferred orientation on N implantation process

Anatase TiO2 films with different level of (0 0 1) preferred orientation were implanted by N ion beam and N doped TiO2 films were obtained. XPS results showed N was about 7.86 ± 0.65 at.% for all N doped TiO2 films, which was chemically bonded as Ti-N and O-N bonds. The ratio of Ti-N/O-N was about 0.81 and 1.56 for N doped TiO2 film with and without (0 0 1) preferred orientation, respectively. Based on the schematic illustration of unrelaxed clean (0 0 1) and (1 0 1) surface of anatase TiO2, the changing of N chemical bond structure and Ti-N/O-N ratio were logically discussed.