کد مقاله کد نشریه سال انتشار مقاله انگلیسی ترجمه فارسی نسخه تمام متن
5465850 1517974 2017 26 صفحه PDF سفارش دهید دانلود کنید
عنوان انگلیسی مقاله ISI
Protective layer for cycloolefin polymer against an aromatic solvent prepared by chemical vapor deposition using cyclosiloxane as a raw molecule
ترجمه فارسی عنوان
لایه محافظ پلیمر سیکلولفین در برابر یک حلال معطر تهیه شده توسط رسوب بخار شیمیایی با استفاده از سیکوسلیسکسان به عنوان مولکول خام
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی
A chemical vapor deposition (CVD) process on the basis of a closed cell system for organosilane coating on cycloolefin polymer (COP) has been developed in order to provide the polymer with the resistivity against aromatic solvents. Prior to the CVD coating, a COP substrate had been made hydrophilic through the surface oxidation with active oxygen species, that is, atomic oxygen and ozone, generated with vacuum ultra-violet (VUV) irradiation at 172 nm in wavelength to atmospheric oxygen molecules. Next, the substrate, cyclosiloxane (tetramethyl-cyclotetrasiloxane, TMCTS) and water liquids were sealed in a closed reaction cell and kept at 80 °C. The substrate was exposed for 3 h to vaporize TMCTS and water so that hydrolyzed TMCTS molecules were chemisorbed and then condensed on the hydrophilic surface, resulting in the formation of a thin film with a thickness about 50 nm. The film was transparent in the visible range. The COP substrate coated with a TMCTS-CVD film showed a resistivity to m-xylene to some extent. When a second TMCTS layer was deposited on a first TMCTS layer that had been rinsed in water and then hydrophilized with VUV oxidation, the resistivity to m-xylene has been much improved. As another approach to improve the solvent resistivity, a monolayer of fluoroalkylsilane (FAS, 1H,1H,2H,2H-tridecafluoro-n-octyltriethoxysilane) was formed on the hydrophilized TMCTS film by a vapor phase method. This FAS-TMCTS double layered film showed an excellent resistivity against m-xylene, most likely because a solvent repellency was provided by the FAS monolayer.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 638, 30 September 2017, Pages 28-33
نویسندگان
, , , ,