Fabrication and characterization of positive and negative copper sulfide micropatterns on self-assembled monolayers

Positive and negative micropatterned copper sulfide thin films were successfully fabricated through chemical bath deposition methods. The thin films were deposited on patterned Si substrates with two different self-assembled monolayers (SAMs), i.e., NH2/CH3 and NH2/OH terminated silane, respectively. Under an optimal depositing condition, the copper sulfide thin films were selectively deposited on NH2 regions. The resultant Cu2S crystal films, in positive and negative circle patterns, respectively, were verified by SEM, XPS, XRD spectra. UV–vis spectrum analysis demonstrated that the prepared Cu2S films exhibited high optical transmission in the visible light regions (vis) and near-infrared region (NIR), and a low band gap of 2.48 eV.

Micropatterns of copper sulfide were fabricated on patterned self-assembled monolayers. The SEM images showed that the regular and compact patterning films were deposited over a large area and had relatively high selectivity.Figure optionsDownload as PowerPoint slide