Tribological and electrical properties of nanocrystalline Cu films deposited by DC magnetron sputtering with varying temperature

Cu films were deposited on Si substrates by direct current (DC) magnetron sputtering at three different substrate temperatures such as room temperature (RT), 100 °C and 200 °C. Possible mechanisms for substrate temperature dependent microstructure evolution in Cu films are discussed in this paper. Enhanced mechanical properties such as high hardness, high elastic modulus, low friction coefficient and high wear resistance of the films were obtained at deposition temperature of 100 °C. However, high friction coefficient as well as high wear rate was measured in films deposited at room temperature and 200 °C.

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► Cu film is deposited by DC magnetron sputtering on the silicon substrate.
► Temperature dependent growth of nanocrystalline Cu grains and properties are studied.
► Films shows high hardness and elastic modulus with low friction coefficient and high wear resistance.
► High electrical conductivity of the films are measured compared to bulk Cu.