کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
6743234 | 1429324 | 2018 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Blistering of tungsten films deposited by magnetron sputtering after helium irradiation
ترجمه فارسی عنوان
طویل شدن فیلمهای تنگستن که توسط اسپری شدن مگنترون پس از تابش هلیوم پوشیده شده اند
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کلمات کلیدی
اسپری مگنترون، تنش فشاری، فیلم تنگستن، تاول، اشعه هلیم،
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی انرژی
مهندسی انرژی و فناوری های برق
چکیده انگلیسی
In this paper, tungsten films were deposited on tungsten substrates by magnetron sputtering and some films were annealed at 1273â¯K for 1â¯h. Subsequently, the morphology and microstructure of as-deposited and pre-annealed films were measured by scanning electron microscopy and X-ray diffraction. In addition, both films were exposed to helium ions with energy of 60â¯keV and fluence of 1.0â¯Ãâ¯1022â¯mâ2 at room temperature. After helium irradiation, the blisters formed on surface of films induced by helium irradiation were observed by scanning electron microscopy. Here we report the differences in blistering on surface between as-deposited and pre-annealed films. In addition, in spite of similar microstructure of both films including grain size and preferred orientation, the different compressive stresses within both films lead to the different behaviors of blistering.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Fusion Engineering and Design - Volume 129, April 2018, Pages 230-235
Journal: Fusion Engineering and Design - Volume 129, April 2018, Pages 230-235
نویسندگان
Jiangang Yu, Wenjia Han, Zhe Chen, Kaigui Zhu,