کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
675577 | 1459626 | 2007 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Measurement of the thermal conductivity of TiO2 thin films by using the thermo-reflectance method
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی شیمی
جریان سیال و فرایندهای انتقال
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The through-plane thermal conductivity of TiO2 thin films, with the thicknesses of 150 and 300Â nm, deposited on silicon wafers and heat treated at several different temperatures was measured using the thermo-reflectance method which utilizes the reflectance variation of the films surface produced by the periodic temperature variation. The results showed that the thermal conductivities were 0.7-1.7Â WÂ mâ1Â Kâ1 and increase as the heat treatment temperature increases. They are explained by the grain size and the density of the heat treated films. Also the thermal conductivity of 300Â nm thick film is larger than that of 150Â nm thick film by 30%. The reason for that was assumed to be the thermal resistance between the thin film, metal film and the substrate.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thermochimica Acta - Volume 455, Issues 1â2, 1 April 2007, Pages 55-59
Journal: Thermochimica Acta - Volume 455, Issues 1â2, 1 April 2007, Pages 55-59
نویسندگان
Jungho Mun, Sok Won Kim, Ryozo Kato, Ichiro Hatta, Sang Hyun Lee, Kweon Ho Kang,