کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
7170972 | 1463455 | 2018 | 8 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Development and adhesion characterization of a silicon wafer for temporary bonding
ترجمه فارسی عنوان
مشخصه توسعه و چسبندگی ویفر سیلیکونی برای اتصال موقت
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موضوعات مرتبط
مهندسی و علوم پایه
سایر رشته های مهندسی
مهندسی مکانیک
چکیده انگلیسی
The development of a silicon temporary carrier for thin wafer handling for 3D applications was investigated. Process selection and optimization ended up with a silicon carrier entirely covered with an antistick layer based on a fluorinated polymer. The carrier preparation was quite easy because only one coating was used and no sticking edge zone was needed onto the carrier. The fluorinated coating led to a very hydrophobic behavior. When bonded with a thermoplastic glue, it also exhibited very antiadhesive properties because the adherence was as low as 0.4 J/m2 and lower than the adherence of a stack without any antiadhesive layer (above 4 J/m2). The carrier was nevertheless suitable for different back side processes in 300 mm: grinding, chemical cleaning, chemical mechanical polishing and silicon oxide deposition. Compared with a commercial carrier, it exhibited the same level of performance for the integration. The proposed carrier was compatible with a mechanical debonding of a thinned bonded structure with a silicon device wafer of 80 µm. The carrier recycling was possible without any new preparation.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: International Journal of Adhesion and Adhesives - Volume 82, April 2018, Pages 100-107
Journal: International Journal of Adhesion and Adhesives - Volume 82, April 2018, Pages 100-107
نویسندگان
P. Montméat, T. Enot, G. Enyedi, M. Pellat, J. Thooris, F. Fournel,