Tailoring the mechanical properties of SiOxHyCz films deposited by atmospheric pressure microwave plasma torch with a Rechtschaffner design of experiments: A pragmatic statistical approach

► We examine the mechanical properties of SiOxHyCz films deposited by PECVD. ► The analysis is performed with a Rechtshaffner design of experiments. ► Transfer functions linking process parameters and mechanical responses are obtained. ► The models are interpreted and validated by analysis of variance. ► A desirability approach allows to converge towards a multi-criteria optimum.