کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8014692 | 1517172 | 2018 | 10 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effect of ammonia plasma treatment on the luminescence and stability of porous silicon
ترجمه فارسی عنوان
اثر درمان پلاسما آمونیاک بر لومینسانس و پایداری سیلیکون متخلخل
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کلمات کلیدی
رسوبات بخار شیمیایی، مواد متخلخل نیمه هادی ها، لومینسانس، مواد نانوکریستال، مواد و خواص نوری،
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی
Effect of ammonia plasma on the luminescence and stability of the porous silicon (PS) has been studied. Samples were cut into different parts to compare the as-deposited sample with the low (5â¯W) and high RF power (75â¯W) treated parts. Scanning electron microscopy (SEM) shown that the samples treated at 5â¯W did not demonstrate a change in the structural aspects, whereas, samples treated at 75â¯W shown some modifications in the final structure. Photoluminescence (PL) spectroscopy revealed strong diminishment in the luminescence as an outcome of plasma treatment for both samples. In comparison to sample treated at 5â¯W, high RF power treated sample did not show recovery in the PL with the course of time. Fourier transform infrared (FTIR) analysis shown the alterations in the hydrogen and oxygen bonding with time for the sample treated at 5â¯W. On the other hand, the appearance of stable nitrogen peaks (Si-N, N-H) were found for the other sample. PL quenching could be due to the appearance of plasma-induced defects and/or hydrogen-related dangling bonds and further shown the stability of the sample treated at 75â¯W (no recovery in PL) for optoelectronic applications.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Letters - Volume 216, 1 April 2018, Pages 277-280
Journal: Materials Letters - Volume 216, 1 April 2018, Pages 277-280
نویسندگان
M. Pérez, A. Dutt, B. de la Mora, E Mon-Pérez, M. Villagrán-Muniz, M.F. GarcÃa-Sánchez, G. Santana,