کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8032707 1517959 2018 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Synthesis and characterization of titanium nitride thin films for enhancement and localization of optical fields
ترجمه فارسی عنوان
سنتز و مشخصه های نازک تیتانیوم نیترید برای افزایش و محلی سازی میدان های نوری
کلمات کلیدی
پلاسمونیک نسوز، اپتیکی غیر خطی، انجام سرامیک، اسپری مگنترون، پراکندگی رامان تحریک شده، نزدیک میدان، پلاریون سطح پلاسما،
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی
Emerging plasmonic materials are an essential driving factor of the ongoing progress towards the empowering of photonic devices functionalities and performance improvement. Transition metal nitrides, being refractory metals with tunable optical properties, are prominent representatives of alternative plasmonic materials. Recent intensive examination of linear and nonlinear optical parameters of metal nitrides has revealed TiN to be a promising media for metal-based optics. Another distinctive feature of TiN is its Raman activity. In contrast to Raman-silent metals, TiN-based structures enable nonlinear light frequency conversion not only to even and odd harmonics, but also to Raman-shifted modes. Moreover, the threshold of the underlying stimulated Raman scattering (SRS) effect in these structures could be greatly reduced by appropriate geometry and material design. Here we experimentally investigate the effect of structure and composition of TiN on its optical properties, such as dielectric permittivity and third-order Raman susceptibility. A special attention is given to synthesis and characterization of TiN thin films suitable for plasmon-assisted localization and amplification of optical signals.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 653, 1 May 2018, Pages 200-203
نویسندگان
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