کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
8033085 1517966 2018 24 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Structural study of NiOx thin films fabricated by radio frequency sputtering at low temperature
ترجمه فارسی عنوان
مطالعه ساختاری از نازک نیکل الیاف ساخته شده توسط پرتو فرکانس رادیویی در دمای پایین
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد فناوری نانو (نانو تکنولوژی)
چکیده انگلیسی
Structure and crystal growth of nickel oxide thin films (10-300 nm) prepared by low-temperature sputtering have been investigated by scanning electron microscopy (SEM), X-ray diffraction, and spectroscopic ellipsometry. Very thin films are compact and homogeneous and are made of almost randomly oriented crystals. A preferential growth direction is then observed following the (111), (220) and (311) planes to the detriment of the (222) and (200) planes, inducing a growth of the materials in columns perpendicularly to the substrate. An optical model able to account for this particular structure has been created from the spectroscopic ellipsometry measurements, and correlates well with the structure observed by SEM. Moreover, it enables an accurate estimation of the thickness without damage to the substrate.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 646, 31 January 2018, Pages 209-215
نویسندگان
, , , , , , , , ,