کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
8044888 | 1518945 | 2016 | 5 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The structure and toughness of TiN coatings prepared by modulated pulsed power magnetron sputtering
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
سطوح، پوششها و فیلمها
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چکیده انگلیسی
Titanium nitride (TiN) coatings were prepared on different substrates (Si wafer, M2 steel, glass) by modulated pulsed power (MPP) sputtering and continuous dc magnetron sputtering (dcMS). The structure and properties were characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM), nanoindentation and the Vickers indentation test. It was found that the structure was transformed from the columnar growth to the branched growth as the peak target current density (Id) increased to 0.4 A/cm2. The results of plasticity index δH and microindentation crack showed the toughness was improved. MPP TiN coating could withstand the maximum load of 4.9 N when microindentation crack was first discovered at 0.4 A/cm2 while 0.49 N at 0.02 A/cm2 in dcMS condition. This indicated that the high ion flux bombardment of the MPP plasma could be applied to change the structure and toughen TiN coatings.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Vacuum - Volume 125, March 2016, Pages 165-169
Journal: Vacuum - Volume 125, March 2016, Pages 165-169
نویسندگان
Hongtao Li, Yanjie Liu, Bailing Jiang, Jinfeng Kan, Zheng Liu,