Deposition angle dependence of optical and structural properties of titanium nano-layers

Titanium nano-layers on glass substrates were prepared by physical vapor deposition method, under HV conditions, with different deposition angles of 0°, 10° and 15° at 373 K temperature. The layers thickness is measured 21 nm, by quartz crystal technique. The nano-structures of the films were obtained, using X-ray diffraction (XRD), and atomic force microscopy (AFM) methods, and their optical properties were determined by spectrophotometer in the spectral range of 400–800 nm. The optical functions were calculated by using Kramers–Kronig relations. The effective medium approximation analysis was employed to establish the relationship between the nano-structure and (EMA) predictions. The aim of this research is to use different deposition angles to produce titanium nano layers, and investigate the relation between nano-structures and optical properties. Nano-structure of the layers showed tapered crystallites separated by voids (porous structure), that is in agreement with, Zone I of structure zone model. There was no clear crystallographic direction for the layers produced in this work.The optical data, show dependence to deposition angle, and there is a good agreement between them and Johnson and Christy's data [17].