کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
9812929 | 1518122 | 2005 | 4 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
The study of doped DLC films by Ti ion implantation
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موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Diamond-like carbon (DLC) films were prepared by unbalanced magnetron sputtering. Ti-doped DLC films were obtained by Ti ion implanted into the achieved DLC films using metal vapor vacuum arc (MEVVA). The effects of Ti+ ion implantation on the surface morphology, structure, and tribological properties of the DLC films were investigated by means of atomic force microscopy (AFM), Raman spectroscopy, transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), and friction measurement. The smooth and uniform Ti-doped film with the surface roughness of 0.595 nm was obtained. Raman result revealed that the formation of DLC films and sp2 bonds content increase by Ti+ ion implantation. TEM showed that the nanocrystalline phases of TiC were formed in the films. Ti+ was implanted into the interface between C and substrate, detecting the sputtering depth profiles of the film by XPS; thus, the interface was widened due to reserve diffusion. Tribological test experiment indicated that friction coefficient of the films decreased to approximately 0.15 by Ti+ ion implantation.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Thin Solid Films - Volume 475, Issues 1â2, 22 March 2005, Pages 279-282
Journal: Thin Solid Films - Volume 475, Issues 1â2, 22 March 2005, Pages 279-282
نویسندگان
Liu Cui, Li Guoqing, Chen Wenwu, Mu Zongxin, Zhang Chengwu, Wang Liang,