Keywords: نرخ رسوب بالا; Hot target sputtering; Energy balance; Chromium film; High deposition rate; Film properties;
مقالات ISI نرخ رسوب بالا (ترجمه نشده)
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در صورتی که به ترجمه آماده هر یک از مقالات زیر نیاز داشته باشید، می توانید سفارش دهید تا مترجمان با تجربه این مجموعه در اسرع وقت آن را برای شما ترجمه نمایند.
Keywords: نرخ رسوب بالا; Microcrystalline silicon; Solar cells; Low impurity concentration; High deposition rate; Spectral response;
Keywords: نرخ رسوب بالا; CVD; PECVD; MagPECVD; ArcPECVD; Permeation barrier; Low pressure; High deposition rate;
Influence of deposition temperature on crystalline structure and morphologies of Co3O4 films prepared by a direct liquid injection chemical vapor deposition
Keywords: نرخ رسوب بالا; Direct liquid injection CVD; Co3O4 films; High deposition rate; Porous; Nano-wall;
Investigation on influence of deposition rate of YBa2Cu3O7 − δ superconducting film prepared on Hastelloy C276 substrate by spray atomizing and coprecipitating laser chemical vapor deposition
Keywords: نرخ رسوب بالا; YBCO film; Spray atomizing and coprecipitating laser chemical vapor deposition; High deposition rate
High-speed deposition of highly (001)-oriented SrCO3 films prepared using laser chemical vapor deposition
Keywords: نرخ رسوب بالا; Laser CVD; SrCO3; High deposition rate; Orientation
Epitaxial growth of (104)- and (018)-oriented LiCoO2 films on MgO single crystals prepared by chemical vapor deposition
Keywords: نرخ رسوب بالا; Lithium cobaltate; Epitaxial growth; High deposition rate; Twin structure; MOCVD; Lithium ion batteries
Fast epitaxial growth of a-axis- and c-axis-oriented YBa2Cu3O7âδ films on (1 0 0) LaAlO3 substrate by laser chemical vapor deposition
Keywords: نرخ رسوب بالا; YBa2Cu3O7âδ; Laser chemical vapor deposition; High critical temperature; High deposition rate;
High-speed epitaxial growth of (100)-oriented CeO2 film on r-cut sapphire by laser chemical vapor deposition
Keywords: نرخ رسوب بالا; Laser chemical vapor deposition; CeO2; High deposition rate; r-cut sapphire
Effect of additional VHF plasma source base on conventional RF-PECVD for large area fast growth microcrystalline silicon films
Keywords: نرخ رسوب بالا; Microcrystalline silicon; Very high frequency (VHF) plasma; High deposition rate
High deposition rate hydrogenated polymorphous silicon characterized by different capacitance techniques
Keywords: نرخ رسوب بالا; Polymorphous silicon; High deposition rate; Capacitance; Deep level transient spectroscopy;
Preparation of highly (100)-oriented CeO2 films on polycrystalline Al2O3 substrates by laser chemical vapor deposition
Keywords: نرخ رسوب بالا; Laser chemical vapor deposition; CeO2 film; High deposition rate
Influence of laser power on the orientation and microstructure of CeO2 films deposited on Hastelloy C276 tapes by laser chemical vapor deposition
Keywords: نرخ رسوب بالا; Laser chemical vapor deposition; CeO2; High deposition rate;
Development of microcrystalline silicon thin films with high deposition rate (over 10 nm/s) using VHF hollow electrode enhanced glow plasma
Keywords: نرخ رسوب بالا; Microcrystalline; Silicon thin films; VHF–HEEPT; High deposition rate
Characterization of ultra-fast deposited polycrystalline graphite by a CO2 laser-assisted combustion-flame method
Keywords: نرخ رسوب بالا; 81.05.Uw; 81.16.Mk; 68.37.Hk; High deposition rate; Crystalline graphite; Laser-assisted combustion-flame deposition;
High deposition rates of uniform films in tetramethylsilane-based plasmas generated by elementary microwave sources in matrix configuration
Keywords: نرخ رسوب بالا; Matrix plasma; PECVD; High deposition rate; SiCH based films; XPS analysis
Deposition of device quality silicon nitride with ultra high deposition rate (> 7 nm/s) using hot-wire CVD
Keywords: نرخ رسوب بالا; Silicon nitride; Hot-wire CVD; Multicrystalline solar cells; High deposition rate
Investigation of plasma parameters in 915 MHz ECR plasma with SiH4/H2 mixtures
Keywords: نرخ رسوب بالا; Microcrystalline silicon; ECR plasma; Electron temperature; High deposition rate
Polymorphous silicon thin films deposited at high rate: Transport properties and density of states
Keywords: نرخ رسوب بالا; Polymorphous silicon; High deposition rate; Transport properties; Defects
Distributed electron cyclotron resonance plasma: A technology for large area deposition of device-quality a-Si:H at very high rate
Keywords: نرخ رسوب بالا; Amorphous silicon; High deposition rate; Gas flow rate; Sheath potential; Residence time;
All hot wire CVD TFTs with high deposition rate silicon nitride (3 nm/s)
Keywords: نرخ رسوب بالا; Thin film transistors; Silicon nitride; High deposition rate; Hot wire chemical vapor deposition
Optimization of a thermal-CVD system for carbon nanotube growth
Keywords: نرخ رسوب بالا; 81.07.De; 81.05.Uw; 81.15.GhCarbon nanotubes; High deposition rate; Taguchi robust design
Microcrystalline silicon deposited at high rate on large areas from pure silane with efficient gas utilization
Keywords: نرخ رسوب بالا; μcμc-Si:H; RF PECVD; Pure silane; High deposition rate; Large area
Microcrystalline silicon solar cells fabricated by VHF plasma CVD method
Keywords: نرخ رسوب بالا; Microcrystalline silicon; High deposition rate; Solar cell; Three-stacked junction; VHF plasma;