کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
10140114 1645991 2019 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Preparation of AlSb thin films by magnetron sputtering technology and its deliquescence mechanism
موضوعات مرتبط
مهندسی و علوم پایه سایر رشته های مهندسی مهندسی برق و الکترونیک
پیش نمایش صفحه اول مقاله
Preparation of AlSb thin films by magnetron sputtering technology and its deliquescence mechanism
چکیده انگلیسی
In this paper, the AlSb films were successfully prepared by direct-current (DC) magnetron sputtering technology and the deliquescence process and mechanism of AlSb films were investigated, moreover, the function of Cu membrane deposited on AlSb films was simply explored. It suggested that deliquescence processes of films were essentially local deliquescence and further formed some sand holes, ultimately, AlSb films fall off from the quartz glass substrate as increase in contact time between AlSb films and ambient air. Meanwhile, compared to bare AlSb films, Cu deposited on AlSb films could effectively prevent the appearance of sand holes in the specific conditions and the way of annealing treatment further improved the stability of AlSb films.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Science in Semiconductor Processing - Volume 89, January 2019, Pages 126-130
نویسندگان
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