کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10142379 | 1646098 | 2018 | 9 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Investigation of microstructure and properties of magnetron sputtered Zr-Si-N thin films with different Si content
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
مهندسی مواد
فناوری نانو (نانو تکنولوژی)
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Zr-Si-N thin films with varying silicon content were deposited by reactive magnetron sputtering in order to investigate the effect of Si content in microstructure, morphology, mechanical properties and oxidation resistance of the coatings. Characterizations were carried out using RBS, GAXRD, XPS, nanohardness, SEM and oxidation tests. Silicon content was set between 0 and 15â¯at.%. GAXRD results indicate peak intensity reduction and broadening increase due silicon nitride segregation, which is responsible for grain size reduction, reaching magnitudes lower than 10â¯nm, calculated by Scherrer. XPS confirmed the presence of compounds like ZrN and Si3N4. ZrN film is almost fully oxidized at 773â¯K, while films with high silicon content maintain ZrN grains stable at 973â¯K. Silicon addition to ZrN provided an increment in hardness values of 32% and also increased H3/E2 ratio.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface and Coatings Technology - Volume 353, 15 November 2018, Pages 355-363
Journal: Surface and Coatings Technology - Volume 353, 15 November 2018, Pages 355-363
نویسندگان
P.C. Silva Neto, F.G.R. Freitas, D.A.R. Fernandez, R.G. Carvalho, L.C. Felix, A.R. Terto, R. Hubler, F.M.T. Mendes, A.H. Silva Junior, E.K. Tentardini,