The microstructure and properties of C and W co-doped NiCr embedded thin film resistors

C and W co-doped NiCr alloy flexible thin films were prepared using closed magnetic field unbalanced magnetron sputtering method on a copper foil substrate. The microstructure, electrical properties, and corrosion resistance of the co-doped NiCr thin film were investigated and analyzed as embedded resistor materials. After co-doping, the alloy thin film embedded resistor materials exhibited considerably lower temperature coefficient of resistance (TCR), larger sheet resistance and higher corrosion resistance comparing to the NiCr alloy thin film embedded resistor materials.