کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
10998082 | 1388449 | 2019 | 25 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Nanostructure and photocatalytic properties of TiO2 films deposited at low temperature by pulsed PECVD
دانلود مقاله + سفارش ترجمه
دانلود مقاله ISI انگلیسی
رایگان برای ایرانیان
کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The nanostructure and photocatalytic properties of TiO2 thin films deposited by PECVD on silicon substrates were investigated. The films were grown at low temperature (<120â¯Â°C) in an rf inductively coupled oxygen/titanium tetraisopropoxide plasma, in continuous and pulsed modes with different plasma-on time (via variation of the duty cycle, DC). All the films exhibit nano-columnar structures, but the reduction of plasma-on time by decreasing the duty cycle for pulsed mode leads to a more homogenous morphology with a diminished column size, and a decrease in the surface roughness. TiO2 layers containing a high amount of anatase were grown at substrate temperatures less than 100â¯Â°C corresponding to DCâ¯â¥â¯40%, then the crystallization was hindered with the decrease of DC, even inducing amorphous films for DCâ¯â¤â¯10%. Moreover, the films deposited below 100â¯Â°C with deposition conditions where 50%â¯â¤â¯DCâ¯â¤â¯75% were shown to present a high photocatalytic activity, likely due to the presence of anatase crystalline nanocolumns at the surface.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 466, 1 February 2019, Pages 63-69
Journal: Applied Surface Science - Volume 466, 1 February 2019, Pages 63-69
نویسندگان
D. Li, S. Bulou, N. Gautier, S. Elisabeth, A. Goullet, M. Richard-Plouet, P. Choquet, A. Granier,