Preparation of ZnO nanoparticles by different pulsed laser energy

• Zinc oxide thin films were deposited on FTO coated glass by RF-magnetron sputtering.
• The energy gap of the deposited ZnO films was in the range of 3.36–3.38 eV.
• AFM images proved that grain size and Ra decreased but Rsk, Rku and Rdq increased.
• After laser exposure the optimum grain sizes was 180.

Zinc oxide nano thin films were deposited on conducting Fluorine Tin Oxide (FTO) coated glass by RF-magnetron sputtering under different deposition time and exposed different laser energy. The XRD analysis revealed the uniform preferential growth along the (0 0 2) of ZnO films and exhibited the hexagonal wurtzite type structure with good crystallinity. The energy gap of the deposited ZnO films was in the range of 3.36 eV and 3.38 eV for 15 and 45 min deposition time, respectively. The triangle ZnO nanoparticles formed a homogenous film on the substrates without any discontinuities which was exhibited from the SEM micrographs. AFM images proved that grain size and Ra decreased but Rsk, Rku and Rdq increased for samples with different deposition times. After laser exposure with different energy the optimum grain sizes were 180 and 170 nm at 50 mj laser energy for 15 and 45 min deposition time, respectively.