CVD TiC/alumina multilayer coatings grown on sapphire single crystals

Multilayers of TiC/α-Al2O3 consisting of three (1 μm thick) alumina layers separated by thin (∼10 nm) oxidized TiC layers have been deposited onto c-, a- and r-surfaces of single crystals of α-Al2O3 by chemical vapour deposition (CVD). The aim of this paper is to describe and compare the detailed microstructure of the different multilayer coatings by using transmission electron microscopy (TEM).The general microstructure of the alumina layers is very different when deposited onto different surfaces of α-Al2O3 single crystal substrates. On the c- and a-surfaces the alumina layers grow evenly resulting in growth of single crystal layers of TiC and alumina throughout the coating. However, when deposited on the r-surface the alumina layers generally grow unevenly. No pores are observed within the alumina layers, while a small number of pores are found at the interfaces below the TiC layers. The TiC and alumina layers grow epitaxially on the c- and a-surface substrates. On the r-surface, epitaxy is present only at some rare locations. The TiC layers were oxidized in situ for 2 min in CO2/H2 prior to the alumina layer deposition. For all three samples chemical analyses show that the whole TiC layer is oxidized. On the c- and a-surfaces the TiC layer was oxidized to an fcc TiCO phase. On the r-surface the oxidation stage resulted in a transformation of the initially deposited fcc TiC to a monoclinic TiCO phase, which appears to be a modified TiO structure with a high carbon content.

► The general microstructure of the alumina layers depends on the underlying surface.
► The TiC and alumina layers grow epitaxially on the c- and a-surface substrates.
► On the r-surface, epitaxy is present only at some rare locations.
► On the c- and a-surfaces the TiC layer was oxidized to an fcc TiCO phase.
► On the r-surface the initially deposited fcc TiC transformed to a monoclinic TiCO phase.