کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
1591452 1515582 2015 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
The role of quantum confinement in the formation of Schottky barriers in Pb-Si interfaces
موضوعات مرتبط
مهندسی و علوم پایه مهندسی مواد دانش مواد (عمومی)
پیش نمایش صفحه اول مقاله
The role of quantum confinement in the formation of Schottky barriers in Pb-Si interfaces
چکیده انگلیسی
Schottky barriers form when semiconductors are in contact with metal overlayers establishing a common Fermi level. Few theoretical studies of these materials exist as electronic structure calculations are computationally intensive for mismatched interfaces. We explicitly model a Pb(111) film on a Si(111) substrate. For thick Pb overlayers, we find a bulk regime where the Fermi level is pinned. For thin film regimes (less than five overlayers), structural relaxations dominate the interfacial energy as charge transfer is suppressed by quantum confinement. In this case, the Schottky barrier height follows the trend of the metal work function.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Solid State Communications - Volume 217, September 2015, Pages 43-46
نویسندگان
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