Self-cleaning and antireflection properties of titanium oxide film by liquid phase deposition

In this investigation, titanium oxide films were deposited on silicon substrate by liquid phase deposition using a deposition solution of ammonium hexafluoro-titanate and boric acid. The concentration of the boric acid in the deposition solution controls the rate of deposition of titanium oxide film. The titanium oxide film becomes superhydrophilic with a contact angle around 4° after irradiation by UV light. The average reflectance is 5.3% at wavelengths from 400 to 800 nm. Superior wetting and antireflection properties make the film suitable for use in silicon-based solar cells.

► TiO2 films were deposited on silicon substrate by liquid phase deposition.
► The LPD-TiO2 film is superhydrophilic with contact angle around 4°.
► The average reflectance of LPD-TiO2/Si structure is 5.3%.
► LPD-TiO2 film has excellent self-cleaning and antireflection properties.