Nanostructuring methylammonium lead iodide perovskite by ultrafast nano imprinting lithography

- Methylammonium lead iodide thin film nanoimprinting approach is proposed.
- V-groove nanostructures are transferred to the photoactive material via Pulsed-NIL.
- The technique allows to perform the step in less than 1 s.
- The preliminary trials show the possibility to scale up the process.

We report the nanopatterning of the methylammonium lead iodide (MAPbI3) perovskite, a polycrystalline hybrid organic-inorganic semiconductor with very promising perspectives for photovoltaic and optoelectronic applications. Nanopatterning of MAI is obtained via Pulsed-NIL technology, an ultrafast version of the thermal nanoimprint lithography (NIL) based on stamps with integrated heaters. By Pulsed-NIL we were able to replicate onto the hybrid perovskite structures with details at the sub-100 nm scale, in spite of its crystalline nature. This work shows a new possibility for the exploitation of organo-metal halide perovskites in optoelectronic devices with more complex architectures than just planar films.

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