A novel PMMA/NEB bilayer process for sub-20 nm gold nanoslits by a selective electron beam lithography and dry etch

A novel PMMA/NEB bilayer process for sub-20 nm gold nanoslits by a selective electron beam lithography and dry etch

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 172, 25 March 2017, Pages 13-18

Xiaqi Huang, Jinhai Shao, ChialinTsou ChialinTsou, Sichao Zhang, Bingrui Lu, Ling Hao, Yan Sun, Yifang Chen,