|کد مقاله||کد نشریه||سال انتشار||مقاله انگلیسی||ترجمه فارسی||نسخه تمام متن|
|5347155||1503545||2018||4 صفحه PDF||سفارش دهید||دانلود کنید|
- Laser patterning system of CVD single layer Graphene film on SiO2/Si substrate is described using KrF laser irradiation.
- Micro patterns of adjustable widths are produced on CVD Graphene film under various laser parameters.
- Raman spectroscopy is employed to evaluate laser patterning process of in the various regions of the patterned Graphene film.
- Uniformity of produced patterns is confirmed by Raman spectroscopy.
Selective patterning of CVD single layer graphene on SiO2/Si substrate has been performed using a KrF laser. Channels that their widths are affected by laser fluence were produced on graphene film surface in atmospheric environment. Dependence of ablation width of the channels on various laser parameters such as laser fluence and pulse repetition rate was investigated at different scanning speeds. Raman spectroscopy, optical and scanning electron microscopy were employed in order to evaluate the effect of laser irradiation on graphene film. Raman spectra confirm formation of uniform channels on graphene surface. Such patterned graphene films have significant importance in microelectronics and spintronics applications.
Journal: Applied Surface Science - Volume 428, 15 January 2018, Pages 94-97