Effect of modulation periods on the microstructure and mechanical properties of DLC/TiC multilayer films deposited by filtered cathodic vacuum arc method

The high stress of diamond-like carbon (DLC) film limits its thickness and adhesion on substrate. Multilayer structure is one approach to overcome this disadvantage. In this paper, the DLC/TiC multilayer films with different modulation periods (80 nm, 106 nm or 160 nm) at same modulation ratio of 1:1 were deposited on Si(1 0 0) wafer and Ti-6Al-4V substrate by filtered cathodic vacuum arc (FCVA) technology. X-ray diffraction (XRD), transmission electron microscopy (TEM), nanoindention and wear test were employed to investigate the effect of modulation periods on the microstructure and mechanical properties of the multilayer films. The results showed that the residual stress of the DLC/TiC multilayer films could be effectively reduced and the residual stress decreased with the modulation periods decreasing. The hardness of the DLC/TiC multilayer films increased with modulation periods decreasing. The DLC/TiC multilayer film with modulation period of 106 nm had the best wear resistance due to the good combination of hardness, ductility and low compressive stress.