Utilizing Neon Ion Microscope for GaSb nanopatterning studies: Nanostructure formation and comparison with low energy nanopatterning

- Carl Zeiss-neon ion microscope was used to irradiated GaSb surfaces with 5 keV neon.
- In-situ imaging using helium beam and ex-situ imaging using an electron beam were performed.
- Differences in imaging output between the helium and the electron beam were observed.
- Transition occurred in the nanostructure type and formation mechanism as the energy is changed from 2 to 5 keV.
- Collision cascade simulations suggested a transition toward bulk-driven mechanisms.