Reprint of: Physical mechanisms of macroparticles number density decreasing on a substrate immersed in vacuum arc plasma at negative high-frequency short-pulsed biasing

Reduction of MPs density by almost 20% is attributable to ion sputtering after 2 min of processing. It was found that enhanced ion sputtering, MPs evaporation on substrate surface, and even evaporation of MPs in a sheath, can take place depending on the cathode material and the irradiation parameters.