کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5356679 | 1503654 | 2014 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Effects of filtered cathodic vacuum arc deposition (FCVAD) conditions on photovoltaic TiO2 films
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Titanium dioxide (TiO2) films for photovoltaic applications were synthesized using filtered cathodic vacuum arc deposition (FCVAD) technique. Various deposition conditions were tested for an optimal film formation. The conditions included the oxygen (O2) pressure which was varied from a base pressure 10â5 to 10â4, 10â3, 10â2 and 10â1Â Torr, sample holder bias varied using 0 or â250Â V, deposition time varied from 10, 20 to 30Â min, and deposition distance varied from 1 to 3Â cm. The deposited films were also annealed and compared with unannealed ones. The films under various conditions were characterized using optical microscopy, scanning electron microscopy (SEM), atomic force microscopy (AFM), energy-dispersive X-ray spectroscopy (EDS) and Raman spectroscopy techniques. The film transparency increased and thickness decreased to a nanoscale with increasing of the O2 pressure. The transparent deposited films contained stoichiometric titanium and oxygen under the medium O2 pressure. The as-deposited films were TiO2 containing some rutile but no anatase which needed annealing to form.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 310, 15 August 2014, Pages 266-271
Journal: Applied Surface Science - Volume 310, 15 August 2014, Pages 266-271
نویسندگان
C. Aramwit, S. Intarasiri, D. Bootkul, U. Tippawan, B. Supsermpol, N. Seanphinit, W. Ruangkul, L.D. Yu,