کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5357642 | 1388221 | 2010 | 6 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
A simple pathway to ordered silica nanopattern from self-assembling of block copolymer containing organic silicon block
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
Self-assembly of block copolymer is an effective strategy to prepare periodic structures at nanoscale. In this paper an unique and very simple method to prepare inorganic silica nanopattern is demonstrated from self-assembling of poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) on the surface of silicon wafer. To simplify the patterning process, at first we obtain highly ordered PDMS microdomains, which are covered with PS layer by controlling solvent vapor annealing conditions. Following exposure to UV/O3 irradiation, nanopatterned surface consisting of silicon oxide is fabricated directly via selectively etching PS phase and converting PDMS phase into silicon oxide. As tuning the composition of the block copolymer, hexagonally packing dot and straight stripe pattern can be obtained. Finally, the time evolution from spheres morphology to aligned long cylinders is discussed. These results hold promise for nanolithography and the fabrication of nanodevices.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Applied Surface Science - Volume 256, Issue 20, 1 August 2010, Pages 5843-5848
Journal: Applied Surface Science - Volume 256, Issue 20, 1 August 2010, Pages 5843-5848
نویسندگان
Qi Wang, Jinghui Yang, Weiwei Yao, Ke Wang, Rongni Du, Qin Zhang, Feng Chen, Qiang Fu,