Improving the laser damage resistance of oxide thin films and multilayers via tailoring ion beam sputtering parameters

Ion beam sputtering is one of the widely used methods for manufacturing laser optical components due to its advantages such as uniformity, reproducibility, suitability for multilayer coatings and growth of dielectric materials with high packing densities. In this study, single Ta2O5 layers and Ta2O5/SiO2 heterostructures were deposited on optical quality glass substrates by dual ion beam sputtering. We focused on the effect of deposition conditions like substrate cleaning, assistance by 12 cm diameter ion beam source and oxygen partial pressure on the laser-induced damage threshold of Ta2O5 single layers. Afterwards, the obtained information is employed to a sample design and produces a Ta2O5/SiO2 multilayer structure demonstrating low laser-induced damage without a post treatment procedure.