Microstructure and surface properties of chromium-doped diamond-like carbon thin films fabricated by high power pulsed magnetron sputtering

► High C ionization was realized by replacing the pure graphite target to the stably HPPMS discharged Cr target in reactive C2H2 gas. ► Less than 2% Cr atoms were doped in the prepared Cr-DLC films by controlling the poisoning of the target surface induced by reactive gas. ► A smooth surface and a dense structure with high sp3 bond content were obtained due to the intense ion bombardment induced by the highly ionized C flux. ► Compared to the substrate, the Cr-DLC films displayed low friction coefficient and excellent corrosion resistance