Ab initio and RRKM study of the elimination of HF and HCl from chlorofluoroethylene

The elimination of HX (X = F, Cl) from chlorofluoroethylene is investigated by electronic structure and RRKM calculations. At low energies, near threshold, the total HF/HCl branching ratio is greater than unity, but as the energy increases, the ratio becomes less than unity due to an entropic effect.