کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
541133 1450322 2016 5 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Poisson-Schroedinger-Continuity two-dimensional analysis of both short (ballistic) and long (drift-diffusion) III–V FETs
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Poisson-Schroedinger-Continuity two-dimensional analysis of both short (ballistic) and long (drift-diffusion) III–V FETs
چکیده انگلیسی


• Short and long gate QWFETs are analyzed by the Schrödinger-Poisson-Continuity method.
• This is in accordance with the Landauer Transport theory.
• We only need to reassign values for the saturation velocities.
• Valuable information for complex multi-layer devices is obtained.
• This information is usually absent in quantum calculations with simplified geometry.

It was recently shown that the quantum mechanical results of the Landauer theory of conduction, applied to a simple one-layer channel FET, can be recast in the traditional drift-diffusion form but with the mobility and injection velocity redefined in a new context. Based on that, we have performed two-dimensional Poisson-Schrödinger-Continuity calculations for both long drift-diffusion and short ballistic quantum well FETs. Very good agreement with many-layer, state-of-the-art InGaAs devices has been achieved provided that only one parameter, the saturation velocity υsat of the mobility function, is rescaled so that our calculated drain current agrees with the experimental value at very large gate voltages VG. This single value of υsat has been used at all other VG. Our calculations are not only a test of the equivalence described above but valuable information about the sub-threshold regime and especially the leakage currents is obtained. This information is usually absent in rigorous Landauer-type - or equivalently non-equilibrium Green's functions - calculations which are performed in simplified FET systems.

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ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 159, 15 June 2016, Pages 221–225
نویسندگان
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