کد مقاله | کد نشریه | سال انتشار | مقاله انگلیسی | نسخه تمام متن |
---|---|---|---|---|
5424731 | 1395834 | 2008 | 7 صفحه PDF | دانلود رایگان |
عنوان انگلیسی مقاله ISI
Photoelectron spectroscopy from randomly corrugated surfaces
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کلمات کلیدی
موضوعات مرتبط
مهندسی و علوم پایه
شیمی
شیمی تئوریک و عملی
پیش نمایش صفحه اول مقاله
چکیده انگلیسی
The influence of random surface roughness on photoelectron intensities has been investigated by angular-resolved photoelectron spectroscopy and advanced calculations. Randomly corrugated silicon surfaces covered by a native silicon oxide, characterized by atomic force microscopy (AFM), were considered in calculations including the shadowing of photoelectrons and the differences between microscopic and macroscopic electron emission geometry. It is shown that the photoelectron intensity is mainly influenced by the spread of a local area distribution of slopes. The error induced by the random surface corrugation can be, however, acceptably low for the spread lesser than 35°.
ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Surface Science - Volume 602, Issue 7, 1 April 2008, Pages 1440-1446
Journal: Surface Science - Volume 602, Issue 7, 1 April 2008, Pages 1440-1446
نویسندگان
J. Zemek, K. Olejnik, P. Klapetek,