کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
543416 1450394 2009 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Spectroscopic differentiation between O-atom vacancy and divacancy defects, respectively, in TiO2 and HfO2 by X-ray absorption spectroscopy
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Spectroscopic differentiation between O-atom vacancy and divacancy defects, respectively, in TiO2 and HfO2 by X-ray absorption spectroscopy
چکیده انگلیسی

Defect state features have been detected in second derivative O K edge spectra for thin films of nano-crystalline TiO2 and HfO2. Based on soft X-ray photoelectron band edge spectra, and the occurrence of occupied band edge 4f states in Gd(Sc,Ti)O3, complementary spectroscopic features have been confirmed in the pre-edge (<530 eV) and vacuum continuum (>545 eV) regimes of O K edge spectra. Qualitatively similar spectral features have been obtained for thin films of HfO2 and TiO2, and these have been assigned to defect states associated with vacancies. The two electrons/removed O-atom are not distributed uniformly over the TM atoms defining the vacancy geometry, but instead are localized in equivalent d-states: a d2 state for a Ti monovacancy and a d4 state for a Hf divacancy. This new model for electronic structure provides an unambiguous way to differentiate between monovacancy and divacancy arrangements, as well as immobile (or fixed) and mobile vacancies.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 86, Issues 7–9, July–September 2009, Pages 1676–1679
نویسندگان
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