کد مقاله کد نشریه سال انتشار مقاله انگلیسی نسخه تمام متن
543474 1450394 2009 4 صفحه PDF دانلود رایگان
عنوان انگلیسی مقاله ISI
Atomic-scale theory on current-assisted thermochemical degradation mode and its field acceleration via charge trapping of O vacancy in HfSiO4
موضوعات مرتبط
مهندسی و علوم پایه مهندسی کامپیوتر سخت افزارها و معماری
پیش نمایش صفحه اول مقاله
Atomic-scale theory on current-assisted thermochemical degradation mode and its field acceleration via charge trapping of O vacancy in HfSiO4
چکیده انگلیسی

An atomic-scale model for current-assisted field-accelerated thermochemical degradation via charge capturing by O vacancy (VO) is proposed based on first-principles calculations. We found that the electron current enhances the VO formation around the VO itself and the hole current makes the VO transform into the puckered structure. The calculated activation enthalpy for breakdown and the effective dipole moment agree well with the experimental values. We also found that the subordinate carriers in the generated subordinate carrier injection (GSCI) model play critical roles through a disproportion reaction of positively charged VOs.

ناشر
Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Microelectronic Engineering - Volume 86, Issues 7–9, July–September 2009, Pages 1901–1904
نویسندگان
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