The removal of metal impurities from the surface of Czochralski wafers using a porous silicon-based gettering under a gas flow HCl/O2 dry

The removal of metal impurities from the surface of Czochralski wafers using a porous silicon-based gettering under a gas flow HCl/O2 dry

Database: Elsevier - ScienceDirect (ساینس دایرکت)
Journal: Materials Research Bulletin - Volume 91, July 2017, Pages 127-134

Ahmed Zarroug, Zied Ben Hamed, Fakher Laatar, Lotfi Derbali, Hatem Ezzaouia,